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1 sputter etch rate
скорость распыления (скорость распыления, напр., материала на мишень для фотокатодных передающих трубок)Англо-русский словарь промышленной и научной лексики > sputter etch rate
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2 sputtering yield
выход продуктов распыления (поверхности к.-л. материала при ионной бомбардировке)Англо-русский словарь промышленной и научной лексики > sputtering yield
См. также в других словарях:
Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… … Wikipedia
Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… … Wikipedia
Reactive-ion etching — (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High energy ions from the plasma… … Wikipedia
Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… … Wikipedia
Photonic metamaterial — Electromagnetism Electricity · … Wikipedia
